Substrate Module – Susceptor: compatible with 4-inch wafers, deposition thickness non-uniformity below 3%; Rotation Module: variable, controllable from 0 to 50 rpm; Substrate Heating Module: 100–250°C (temperature uniformity within 3%).
Deposition Source – Equipped with two 3-inch targets compatible with RF and DC power; includes one RF power supply (600 W, 13.56 MHz) with shutter; supports multilayer thin film deposition and can mount assist sources during thin film deposition.
장비소개
A PVD-type functional sputtering system that precisely controls thin film properties, used for depositing oxide or other metal films and producing samples for research and production.
A system that performs magnetron sputtering processes at a vacuum of 10-4 Torr and applies a bias ring to maximize the properties of IGZO and TCO thin films.
활용분야
Fabrication of TFT channel layers and sensor thin films.
No. 2
Semiconductor inspection equipment
설치위치
Room 302, Building 55 (Engineering Hall 5)
장비스펙
Keysight B1520A
장비소개
Inspection equipment for semiconductor testing
활용분야
Semiconductor testing, sensor measurement, and related applications.
No. 3
Femtosecond laser
설치위치
Room 302, Building 55 (Engineering Hall 5)
장비스펙
ELMO 780 WHP, pulse power 1W>, pulse length<120fs, 780㎚
장비소개
Laser for multiphoton polymerization 3D printing
활용분야
3D printing, laser cutting, and related applications.
No. 4
Optical microscope
설치위치
Room 302, Building 55 (Engineering Hall 5)
장비스펙
Olympus BX 53
장비소개
Used for observing displays, cells, and more with high resolution and clear images from UV to near-infrared wavelengths.
활용분야
Display quality evaluation, nano/microstructure observation, 3D printing, and related applications.
