저차원 소재 및 소자 연구실(LDMD) > 개별연구실

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개별연구실

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저차원 소재 및 소자 연구실(LDMD)

Low-Dimensional Materials & Devices Lab.

교수명

  • 곽진성 교수

보유 장비

장비 이미지
No. 1
Atomic Layer Deposition

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Supports deposition of Al2O3, HfO2
장비소개
  • A system that precisely grows thin films at the atomic level using gaseous precursors
활용분야
  • Fields that require high uniformity and precise control, such as semiconductor device fabrication and nanomaterial synthesis
장비 이미지
No. 2
X-Ray Diffractometer

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • 40kW, 15mA, 0.6kW
장비소개
  • An instrument that analyzes crystal structure, phases, and lattice constants by irradiating a material with X-rays and measuring the resulting diffraction pattern.
활용분야
  • Fields involving the development of materials and the evaluation of quality across various applications such as semiconductors, batteries, ceramics, and other advanced materials
장비 이미지
No. 3
Raman Spectroscopy

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • 815×660×540mm
장비소개
  • An instrument that analyzes molecular vibrations or lattice vibrations of a material using laser light.
활용분야
  • Fields of materials engineering and life sciences.
  • Used for analyzing chemical composition, crystallinity, stress, and defects of materials.
장비 이미지
No. 4
Spectrofluorophotometer

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Capable of measuring liquid samples.
장비소개
  • An instrument that analyzes the light-emitting properties of a sample to evaluate its electronic characteristics.
활용분야
  • Fields of semiconductor, nanomaterials, and optoelectronic device development.
장비 이미지
No. 5
Spectrofluorophotometer

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Capable of measuring powders, liquid samples, and quantum dots.
장비소개
  • An instrument that analyzes the light-emission properties of a sample to evaluate its electronic characteristics.
활용분야
  • Fields of semiconductor, nanomaterial, and quantum dot research, as well as optoelectronic device development.
장비 이미지
No. 6
Optical Microscope

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Magnification range: 50× to 1000×
장비소개
  • An instrument that magnifies and observes samples using visible light.
활용분야
  • Fields of materials science and electronic devices.
  • Visually analyzes microscopic structures such as material surfaces and micro-defects.
장비 이미지
No. 7
Microwave Reactor

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Maximum temperature: 230 °C, maximum pressure: 20 bar, capacity: up to 18 ml.
장비소개
  • An instrument that uses microwaves to rapidly and uniformly heat samples, thereby accelerating chemical reactions.
활용분야
  • Applications include new material synthesis, organic chemistry, and nanomaterial synthesis.
장비 이미지
No. 8
Chemical Vapor Deposition

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Capable of conducting experiments under atmospheric pressure using gases such as H2, N2, and H2S.
장비소개
  • An instrument that deposits thin films by thermally decomposing gaseous precursors.
활용분야
  • Applications include semiconductors, displays, solar cells, and nanomaterial synthesis.
장비 이미지
No. 9
E-beam evaporator

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Thickness and deposition rate can be controlled.
장비소개
  • An instrument that forms thin films by evaporating materials such as metals or oxides at high temperatures using an electron beam.
활용분야
  • Various precision thin-film deposition applications, including semiconductor device fabrication, optical coatings, sensor manufacturing, and nanotechnology research.
장비 이미지
No. 10
Residual Gas Analyzer

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • 300mm×300mm
장비소개
  • An instrument that precisely detects and analyzes trace gases inside a vacuum chamber using mass spectrometry.
활용분야
  • Used in materials research and vacuum equipment maintenance for applications such as contamination assessment of vacuum systems and monitoring of reactive gases.
장비 이미지
No. 11
Metal Organic Chemical Vapor Deposition

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • 2000mm×1380mm
장비소개
  • An instrument that grows solid thin films using metal-organic compounds as precursors.
활용분야
  • Used for high-quality thin film fabrication in applications such as LEDs, semiconductor devices, high-frequency components, and power devices.
장비 이미지
No. 12
Sputtering

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Equipped with Mo, W, and Ni targets.
장비소개
  • An instrument that uses plasma ions to bombard a target material, causing fine particles to sputter off and deposit as a thin film on a substrate.
활용분야
  • Applications include semiconductors, displays, solar cells, and metal thin-film coatings.
장비 이미지
No. 13
Rapid Thermal Processing

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • 1250℃
장비소개
  • A thermal processing instrument that rapidly heats or cools substrates.
활용분야
  • Applications include semiconductor processes such as annealing and dopant activation, thin film crystallization, and junction formation.
장비 이미지
No. 14
Plasma-Chemical Vapor Deposition

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Capable of using gases such as H2, N2, H2S, and CH4; pressure can be controlled via a throttle valve; plasma generation is possible.
장비소개
  • A chemical vapor deposition (CVD) system that uses plasma to deposit thin films.
활용분야
  • Applications include semiconductor thin film fabrication, displays, solar cells, sensors, and protective coatings.
장비 이미지
No. 15
Graphene-Chemical Vapor Deposition

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Gases used: H2, N2, CH4
장비소개
  • An instrument that deposits thin films by using heat to decompose gaseous precursors.
활용분야
  • Applications include graphene synthesis, thin film deposition, and thin film fabrication.
장비 이미지
No. 16
Electrochemical Workstation

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Maximum current: ±5 A, maximum voltage: ±10 V, current accuracy: 0.6 aA, impedance base frequency range: 10 μHz to 8 MHz.
장비소개
  • An electrochemical analysis instrument capable of performing various experiments such as LSV (Linear Sweep Voltammetry), CV (Cyclic Voltammetry), and EIS (Electrochemical Impedance Spectroscopy).
활용분야
  • Electrochemical applications including water-splitting catalyst evaluation, battery research, sensor development, and corrosion studies.
장비 이미지
No. 17
Probe Station

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Temperature controllable.
장비소개
  • An instrument that measures the electrical properties of semiconductor devices or materials using microprobes.
활용분야
  • Applications include semiconductor device development, material property evaluation, and electrical reliability testing.
장비 이미지
No. 18
Thermal Evaporator

설치위치
  • Building 35 (Natural Sciences Hall 5)
장비스펙
  • Capable of depositing various thin films depending on the deposition source.
장비소개
  • An instrument that forms thin films on a substrate by vaporizing metals or organic materials using resistive heating.
활용분야
  • Applications in thin-film device fabrication, including semiconductor electrodes, optical coatings, OLEDs, and solar cell manufacturing.

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