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Low-Dimensional Materials & Devices Lab.

Professor

  • Professor Jinsung Kwak

Available Equipment

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No. 1
Atomic Layer Deposition
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Supports deposition of Al2O3, HfO2
Description
  • A system that precisely grows thin films at the atomic level using gaseous precursors
Applications
  • Fields that require high uniformity and precise control, such as semiconductor device fabrication and nanomaterial synthesis
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No. 2
X-Ray Diffractometer
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • 40kW, 15mA, 0.6kW
Description
  • An instrument that analyzes crystal structure, phases, and lattice constants by irradiating a material with X-rays and measuring the resulting diffraction pattern.
Applications
  • Fields involving the development of materials and the evaluation of quality across various applications such as semiconductors, batteries, ceramics, and other advanced materials
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No. 3
Raman Spectroscopy
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • 815×660×540mm
Description
  • An instrument that analyzes molecular vibrations or lattice vibrations of a material using laser light.
Applications
  • Fields of materials engineering and life sciences.
  • Used for analyzing chemical composition, crystallinity, stress, and defects of materials.
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No. 4
Spectrofluorophotometer
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Capable of measuring liquid samples.
Description
  • An instrument that analyzes the light-emitting properties of a sample to evaluate its electronic characteristics.
Applications
  • Fields of semiconductor, nanomaterials, and optoelectronic device development.
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No. 5
Spectrofluorophotometer
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Capable of measuring powders, liquid samples, and quantum dots.
Description
  • An instrument that analyzes the light-emission properties of a sample to evaluate its electronic characteristics.
Applications
  • Fields of semiconductor, nanomaterial, and quantum dot research, as well as optoelectronic device development.
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No. 6
Optical Microscope
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Magnification range: 50× to 1000×
Description
  • An instrument that magnifies and observes samples using visible light.
Applications
  • Fields of materials science and electronic devices.
  • Visually analyzes microscopic structures such as material surfaces and micro-defects.
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No. 7
Microwave Reactor
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Maximum temperature: 230 °C, maximum pressure: 20 bar, capacity: up to 18 ml.
Description
  • An instrument that uses microwaves to rapidly and uniformly heat samples, thereby accelerating chemical reactions.
Applications
  • Applications include new material synthesis, organic chemistry, and nanomaterial synthesis.
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No. 8
Chemical Vapor Deposition
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Capable of conducting experiments under atmospheric pressure using gases such as H2, N2, and H2S.
Description
  • An instrument that deposits thin films by thermally decomposing gaseous precursors.
Applications
  • Applications include semiconductors, displays, solar cells, and nanomaterial synthesis.
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No. 9
E-beam evaporator
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Thickness and deposition rate can be controlled.
Description
  • An instrument that forms thin films by evaporating materials such as metals or oxides at high temperatures using an electron beam.
Applications
  • Various precision thin-film deposition applications, including semiconductor device fabrication, optical coatings, sensor manufacturing, and nanotechnology research.
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No. 10
Residual Gas Analyzer
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • 300mm×300mm
Description
  • An instrument that precisely detects and analyzes trace gases inside a vacuum chamber using mass spectrometry.
Applications
  • Used in materials research and vacuum equipment maintenance for applications such as contamination assessment of vacuum systems and monitoring of reactive gases.
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No. 11
Metal Organic Chemical Vapor Deposition
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • 2000mm×1380mm
Description
  • An instrument that grows solid thin films using metal-organic compounds as precursors.
Applications
  • Used for high-quality thin film fabrication in applications such as LEDs, semiconductor devices, high-frequency components, and power devices.
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No. 12
Sputtering
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Equipped with Mo, W, and Ni targets.
Description
  • An instrument that uses plasma ions to bombard a target material, causing fine particles to sputter off and deposit as a thin film on a substrate.
Applications
  • Applications include semiconductors, displays, solar cells, and metal thin-film coatings.
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No. 13
Rapid Thermal Processing
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • 1250℃
Description
  • A thermal processing instrument that rapidly heats or cools substrates.
Applications
  • Applications include semiconductor processes such as annealing and dopant activation, thin film crystallization, and junction formation.
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No. 14
Plasma-Chemical Vapor Deposition
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Capable of using gases such as H2, N2, H2S, and CH4; pressure can be controlled via a throttle valve; plasma generation is possible.
Description
  • A chemical vapor deposition (CVD) system that uses plasma to deposit thin films.
Applications
  • Applications include semiconductor thin film fabrication, displays, solar cells, sensors, and protective coatings.
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No. 15
Graphene-Chemical Vapor Deposition
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Gases used: H2, N2, CH4
Description
  • An instrument that deposits thin films by using heat to decompose gaseous precursors.
Applications
  • Applications include graphene synthesis, thin film deposition, and thin film fabrication.
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No. 16
Electrochemical Workstation
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Maximum current: ±5 A, maximum voltage: ±10 V, current accuracy: 0.6 aA, impedance base frequency range: 10 μHz to 8 MHz.
Description
  • An electrochemical analysis instrument capable of performing various experiments such as LSV (Linear Sweep Voltammetry), CV (Cyclic Voltammetry), and EIS (Electrochemical Impedance Spectroscopy).
Applications
  • Electrochemical applications including water-splitting catalyst evaluation, battery research, sensor development, and corrosion studies.
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No. 17
Probe Station
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Temperature controllable.
Description
  • An instrument that measures the electrical properties of semiconductor devices or materials using microprobes.
Applications
  • Applications include semiconductor device development, material property evaluation, and electrical reliability testing.
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No. 18
Thermal Evaporator
Location
  • Building 35 (Natural Sciences Hall 5)
Specifications
  • Capable of depositing various thin films depending on the deposition source.
Description
  • An instrument that forms thin films on a substrate by vaporizing metals or organic materials using resistive heating.
Applications
  • Applications in thin-film device fabrication, including semiconductor electrodes, optical coatings, OLEDs, and solar cell manufacturing.

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