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Ceramic Microstructure Control Lab.

Professor

  • Professor Sangchae Jeon

Available Equipment

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No. 1
By atmospheric heat treatment
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum temperature: 1700°C.
Description
  • An instrument that controls the internal atmosphere (H2, Ar) during high-temperature heat treatment to prevent oxidation of materials prone to oxidation in air or to enable oxidation and reduction of materials stable in ambient atmosphere。
Applications
  • Used for sintering materials requiring controlled oxidation and other chemical reactions.
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No. 2
S-1700-4.5
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum temperature: 1700°C.
Description
  • Equipment capable of heat treating various materials such as metals, ceramics, and polymers at a wide range of temperatures.
Applications
  • Used for materials requiring high-temperature heat treatment.
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No. 3
S-1700mini
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum temperature: 1700°C.
Description
  • Equipment capable of heat treating various materials such as metals, ceramics, and polymers at a wide range of temperatures.
Applications
  • Used for materials requiring high-temperature heat treatment.
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No. 4
By high-temperature vacuum heat treatment
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum temperature: ２００0°C.
Description
  • Equipment that heats materials in a sealed chamber where air is removed using a vacuum pump, creating an oxygen- and reactive gas-free environment specialized for preventing oxidation, decarburization, and contamination.
Applications
  • Used for sintering materials that require controlled oxidation and other chemical reactions.
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No. 5
YLJ-CSP-40TA
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum temperature: 250°C, maximum pressure: 40 tons.
Description
  • A uniaxial pressing and sintering system that simultaneously applies pressure and sinters, enabling high-density achievement at low temperatures.
Applications
  • Used as a pretreatment before high-temperature heat treatment in fields such as energy materials and structural materials.
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No. 6
SUX-02
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum temperature: 1600°C; maximum heating rate: 50°C per minute.
Description
  • Equipment capable of ultra-fast sintering using microwave waves, significantly reducing the time required for the sintering stage, which is the most time-consuming part of the processing.
Applications
  • Used in environments requiring rapid heating rates or uniform heating inside and outside; enables precise and reliable sample pretreatment with minimal defects during heat treatment processes.
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No. 7
LS-9120M
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Measurement error: 8.0 µm; sampling rate: 16,000 points per second.
Description
  • Equipment that uses a laser light source to non-contact measure specimen length change trends, useful for materials with low strength or when contact-type dilatometers cannot be used.
Applications
  • Suitable for applications where installation of contact-type dilatometers is limited or for measuring length change trends in low-strength materials.
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No. 8
GT2-H32
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Measurement error: 0.5 µm.
Description
  • A contact-type instrument that measures specimen length change trends, offering low measurement error for high-resolution data acquisition.
Applications
  • Suitable for applications requiring high-precision measurement of length change trends.
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No. 9
PULVERISETTE 6
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum rotation speed: 650 rpm; maximum grinding capacity: 225 ml.
Description
  • A high-energy milling system that minimizes loss during grinding of hard, semi-hard, brittle, and moist materials, enabling faster milling compared to other methods.
Applications
  • Used for milling hard materials or reducing milling time.
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No. 10
ATTRITION MILL
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum rotation speed: 1050 rpm; maximum grinding capacity: 1500 ml.
Description
  • A high-energy efficient milling system capable of processing large quantities at once, suitable for applications requiring uniform dispersion.
Applications
  • Used for processing large quantities of material or experiments requiring uniform dispersion.
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No. 11
MECATECH 250 SPC
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Bottom plate rotation speed: 20–700 rpm; head rotation speed: 20–150 rpm.
Description
  • Equipment that automatically polishes material surfaces to achieve a specified surface roughness and flatness.
Applications
  • Used as a pretreatment for observing the microstructure of materials.
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No. 12
AGS-10kNXD
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum load capacity: 10 kN; sampling rate: 1000 Hz.
Description
  • High-precision universal testing machine capable of accurately performing tensile, compression, and bending tests on various materials such as metals, plastics, and ceramics; an electromechanical tabletop system.
Applications
  • Used for standard testing of materials and structures, including tensile, compression, bending strength, shear, hardness, and torsion tests.
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No. 13
Freeze casting apparatus
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Minimum temperature: -60℃
Description
  • Equipment used for freeze casting, which utilizes anisotropic solidification of solvents in slurry to fabricate directional porous ceramics, polymers, metals, and composites.
Applications
  • Used for the fabrication of porous ceramics.
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No. 14
Freeze dryer (lyophilizer)
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Minimum temperature: -90℃
Description
  • Equipment used to remove internal solvents (water) after freeze casting by creating a low-temperature and vacuum environment inside the device to sublimate solvents within the specimen.
Applications
  • Used to remove solvents inside specimens after freeze casting.
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No. 15
Optical microscope
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Maximum magnification: ×1000.
Description
  • Equipment used for observing the microstructure of specimens.
Applications
  • Used for observing the microstructure of specimens.
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No. 16
RPT_CME-300
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Compatible with ceramics, metals, and composite materials.
Description
  • A material extrusion 3D printing system that combines powder injection molding technology and additive manufacturing, used for fabricating three-dimensional shaped bodies by layering metal or ceramic materials.
Applications
  • Used for producing complex-shaped printed objects.
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No. 17
Powder mixer
Location
  • Room 325, Building 54 (Engineering Hall 4)
Specifications
  • Container 2L, 1L(2kg)
Description
  • Equipment used for dry mixing of powders without additional grinding.
Applications
  • Equipment used for dry mixing of powders without additional grinding.

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